The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2006

Filed:

Jul. 14, 2005
Applicants:

John P. Fallon, Andover, MA (US);

John A. Rule, Hingham, MA (US);

Robert N. Jacques, San Diego, CA (US);

Jacob P. Lipcon, Arlington, MA (US);

William N. Partlo, Poway, CA (US);

Alexander I. Ershov, San Diego, CA (US);

Toshihiko Ishihara, San Diego, CA (US);

John Meisner, San Diego, CA (US);

Richard M. Ness, San Diego, CA (US);

Paul C. Melcher, El Cajon, CA (US);

Inventors:

John P. Fallon, Andover, MA (US);

John A. Rule, Hingham, MA (US);

Robert N. Jacques, San Diego, CA (US);

Jacob P. Lipcon, Arlington, MA (US);

William N. Partlo, Poway, CA (US);

Alexander I. Ershov, San Diego, CA (US);

Toshihiko Ishihara, San Diego, CA (US);

John Meisner, San Diego, CA (US);

Richard M. Ness, San Diego, CA (US);

Paul C. Melcher, El Cajon, CA (US);

Assignee:

Cymer, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 3/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) Finjection controls with novel learning algorithm.


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