The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2006
Filed:
Feb. 27, 2003
Hong Zhuang, Raritan, NJ (US);
Joseph E. Oberlander, Phillipsburg, NJ (US);
Ping-hung LU, Bridgewater, NJ (US);
Stanely F. Wanat, Scotch Plains, NJ (US);
Robert R. Plass, Hackensack, NJ (US);
Hong Zhuang, Raritan, NJ (US);
Joseph E. Oberlander, Phillipsburg, NJ (US);
Ping-Hung Lu, Bridgewater, NJ (US);
Stanely F. Wanat, Scotch Plains, NJ (US);
Robert R. Plass, Hackensack, NJ (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.