The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2006
Filed:
Mar. 26, 2003
Applicants:
Yuji Harada, Niigata-ken, JP;
Jun Hatakeyama, Niigata-ken, JP;
Masaru Sasago, Hirakata, JP;
Masayuki Endo, Kishiwada, JP;
Shinji Kishimura, Itami, JP;
Inventors:
Yuji Harada, Niigata-ken, JP;
Jun Hatakeyama, Niigata-ken, JP;
Masaru Sasago, Hirakata, JP;
Masayuki Endo, Kishiwada, JP;
Shinji Kishimura, Itami, JP;
Assignees:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Matsushita Electric Industrial Co., Ltd, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01); C08F 10/00 (2006.01); C08F 12/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing.