The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2006
Filed:
Jan. 29, 2003
Lothar Bauch, Dresden, DE;
Robert Feurle, Neubiberg, DE;
Ina Voigt, München, DE;
Helmut Wurzer, Dresden, DE;
Lothar Bauch, Dresden, DE;
Robert Feurle, Neubiberg, DE;
Ina Voigt, München, DE;
Helmut Wurzer, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A photolithographic mask has the advantage that a combination of dummy structures, whose pattern is imaged into the resist layer, and auxiliary structures, whose pattern is not imaged into the resist layer, makes it possible to achieve a significant improvement in the imaging properties of the main structures which are disposed at an edge of a region containing a multiplicity of main structures. In particular, constrictions at the structures can be significantly reduced or completely avoided and/or a so-called 'tilting' of the structures under non-optimum focus conditions is significantly reduced or completely avoided.