The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2006
Filed:
Jun. 10, 2004
Applicants:
Boris Verman, Bloomfield, MI (US);
Jimpei Harada, Tokyo, JP;
Inventors:
Boris Verman, Bloomfield, MI (US);
Jimpei Harada, Tokyo, JP;
Assignee:
Osmic, Inc., Auburn Hills, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.