The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2006

Filed:

Mar. 24, 2003
Applicants:

Shi-tron Lin, Taipei, TW;

Wei-fan Chen, Taichung, TW;

Inventors:

Shi-Tron Lin, Taipei, TW;

Wei-Fan Chen, Taichung, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/62 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electrostatic discharge protection device formed on a substrate. The electrostatic discharge protection device includes a first isolation region formed over the substrate, an active region formed over the substrate and enclosed by the first isolation region, a second isolation region formed on the substrate and substantially surrounded by the active region, a first gate element formed in the active region, the first gate element having a first end extending over the first isolation region and a second end extending over the second isolation region, a drain region formed in the active region at a first side of the first gate element, a source region formed in the active region at a second side of the first gate element, a drain contact for electrically coupling the drain region to a first node, and a source contact for electrically coupling the source region to a second node.


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