The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2006
Filed:
Mar. 05, 2004
Alexei A. Erchak, Cambridge, MA (US);
John W. Graff, Swampscott, MA (US);
Michael Gregory Brown, Tyngsboro, MA (US);
Scott W. Duncan, Andover, MA (US);
Milan S. Minsky, Newton, MA (US);
Alexei A. Erchak, Cambridge, MA (US);
John W. Graff, Swampscott, MA (US);
Michael Gregory Brown, Tyngsboro, MA (US);
Scott W. Duncan, Andover, MA (US);
Milan S. Minsky, Newton, MA (US);
Luminus Devices, Inc., Woburn, MA (US);
Abstract
A method includes disposing a planarization layer on a surface of a layer of semiconductor material and disposing a lithography layer on a surface of the planarization layer. The method also includes performing nanolithography to remove at least a portion of the planarization layer, at least a portion of the lithography layer and at least a portion of the layer of semiconductor material, thereby forming a dielectric function in the surface of the layer of semiconductor material that varies spatially according to a pattern.