The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Jun. 15, 1999
Shinji Wakui, Utsunomiya, JP;
Takehiko Mayama, Utsunomiya, JP;
Shuichi Adachi, Utsunomiya, JP;
Hiroaki Kato, Utsunomiya, JP;
Shinji Wakui, Utsunomiya, JP;
Takehiko Mayama, Utsunomiya, JP;
Shuichi Adachi, Utsunomiya, JP;
Hiroaki Kato, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a motion control system, the motion control system including a structure, a plurality of actuators to apply forces to the structure, respectively, and a plurality of sensors to sense motion states of the structure, respectively. The apparatus includes a pseudo-random signal generator to generate a plurality of pseudo-random signals and to apply the plurality of pseudo-random signals to the plurality of actuators, the plurality of pseudo-random signals being equal in number to a number of degrees of freedom of the motion control system, a storage unit to store a first plurality of time-series data obtained by the plurality of sensors with a second plurality of time-series data corresponding to the plurality of pseudo-random signals, and a characteristic deriving unit to derive a characteristic of the motion control system based on the first and second plurality of time-series data.