The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Dec. 13, 2004
Nobuo Ishii, Amagasaki, JP;
Kibatsu Shinohara, Yokohama, JP;
Nobuo Ishii, Amagasaki, JP;
Kibatsu Shinohara, Yokohama, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A plasma processing apparatus includes a processing container, a mounting tablearranged in the processing containerto support a wafer W, a sealing plateopposed to the wafer W supported by the mounting table, an annular antennaarranged on the sealing plateand consisting of an annular waveguide to introduce a microwave into the processing containerthrough the sealing plate, the annular antennabeing arranged so that a plane containing an annular waveguide path defined by the annular waveguide is generally parallel with the sealing plate, a directional couplerarranged on the periphery of the annular antenna, a propagation waveguideconnected to the directional couplerand a microwave oscillatorconnected to the propagation waveguide. 'Accordingly, it is possible to form an uniform microwave in the antenna, so that an uniform plasma can be produced in the processing container'.