The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Feb. 18, 2002
Isao Nishimura, Tokyo, JP;
Nobuo Bessho, Tokyo, JP;
Atsushi Kumano, Tokyo, JP;
Kenji Yamada, Kyoto, JP;
Isao Nishimura, Tokyo, JP;
Nobuo Bessho, Tokyo, JP;
Atsushi Kumano, Tokyo, JP;
Kenji Yamada, Kyoto, JP;
JSR Corporation, Tokyo, JP;
Abstract
A method of forming a refractive index pattern or an optical material stable regardless of use conditions, which provides a sufficiently large change in refractive index by a simple method. The refractive index pattern or optical material is formed by exposing a refractive index changing composition which comprises (A) a decomposable compound, (B) a non-decomposable compound containing inorganic oxide particles and (C) a radiation sensitive decomposer to radiation and then treating it with (D) a stabilizer.