The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2006

Filed:

Nov. 12, 2003
Applicants:

Jacques C. S. Kools, Sunnyvale, CA (US);

Randhir Bubber, San Ramon, CA (US);

Ming Mao, Pleasanton, CA (US);

Thomas Andrew Schneider, Livermore, CA (US);

Jinsong Wang, Pleasanton, CA (US);

Inventors:

Jacques C. S. Kools, Sunnyvale, CA (US);

Randhir Bubber, San Ramon, CA (US);

Ming Mao, Pleasanton, CA (US);

Thomas Andrew Schneider, Livermore, CA (US);

Jinsong Wang, Pleasanton, CA (US);

Assignee:

Veeco Instruments, Inc., Woodbury, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for fabricating a conformal thin film on a substrate are disclosed. The method includes introducing a gas from a gas inlet into an expansion volume associated with an atomic layer deposition (ALD) system. The gas is flowed through a diffuser plate adjacent to the expansion volume and a reaction chamber. The diffuser plate includes a protrusion located opposite the gas inlet and the protrusion reduces turbulence in the expansion volume.


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