The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
Dec. 14, 2000
Pierre Leroux, San Antonio, TX (US);
Pierre Leroux, San Antonio, TX (US);
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
A system and method for fabricating integrated circuits using four fine alignment targets per stepper shot. The four alignment targets are disposed within the scribe line on each side of a four-sided stepper shot. The targets on opposites sides of the region are located in mirror-image positions. For example, in a square or rectangular region, the targets could be at the mid-point of each side, or at each corner. Because the scribe lines for adjoining stepper shots overlap, a target in one shot will overlay a target from a preceding shot. In a positive resist process, for example, the target resulting from the overlay will be reduced in size by an amount corresponding to the amount of rotational error, if any. However, the target will still indicate the center of the stepper shot, thereby compensating for the rotational error with no further measurements.