Extreme ultraviolet light source

Abstract

An extreme ultraviolet light source device which makes it possible to increase a working distance and obtain extreme ultraviolet light with a high output. The extreme ultraviolet light source device generates a plasma by irradiating a target () with laser light from a driving laser device (), and generates extreme ultraviolet (EUV) light with a wavelength of several nanometers to several tens of nanometers. The extreme ultraviolet light source device comprises a target supply device which has a charge applying unit () that applies a charge to the target (), and an acceleration unit () which accelerates the charged target () using an electromagnetic field. The target supply device supplies the target () comprised of a rare gas element such as xenon (Xe) or the like, or a metal such as lithium (Li), tin (Sn), tin oxide (SnO) or the like, as ionized molecules, atoms or masses comprising a plurality of atoms, or as ionized clusters.