The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
Feb. 21, 2003
Sudhakar Balijepalli, Midland, MI (US);
Dale J. Aldrich, Lake Jackson, TX (US);
Laura A. Grier, Brazoria, TX (US);
Bedri Erdem, Pearland, TX (US);
Gregory F. Meyers, Midland, MI (US);
Sudhakar Balijepalli, Midland, MI (US);
Dale J. Aldrich, Lake Jackson, TX (US);
Laura A. Grier, Brazoria, TX (US);
Bedri Erdem, Pearland, TX (US);
Gregory F. Meyers, Midland, MI (US);
Dow Global Technologies, Inc., Midland, MI (US);
Abstract
Provided is a method for manufacturing a fixed abrasive material suitable for use in CMP planarization pads from an aqueous polymer dispersion that also includes abrasive particles that involves frothing the polymer dispersion, applying the froth to a substrate, mold or carrier and curing the froth to form a fixed abrasive material having an open cell structure containing between about 5 and 85 wt % abrasive particles and a dry density of about 350 kg/mto 1200 kg/m.