The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2006

Filed:

Jun. 13, 2003
Applicants:

Hiroshi Mori, Yamato, JP;

Tomoyuki Kikugawa, Atsugi, JP;

Yoshio Takahashi, Sagamihara, JP;

Motoaki Fujita, Atsugi, JP;

Inventors:

Hiroshi Mori, Yamato, JP;

Tomoyuki Kikugawa, Atsugi, JP;

Yoshio Takahashi, Sagamihara, JP;

Motoaki Fujita, Atsugi, JP;

Assignee:

Anritsu Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/08 (2006.01); H01S 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

First and second diffraction grating layers are provided above a semiconductor substrate, and are spaced from each other in an output direction of a beam with a flat connecting layer sandwiched therebetween. An active layer is disposed above or below the first and second diffraction grating layers and the connecting layer. A cladding layer is disposed above the active layer or above the first and second diffraction grating layers and the connecting layer. A diffraction grating including the first and second diffraction grating layers has a plurality of slits penetrating from an upper surface to a lower surface that are perpendicular to the output direction of the beam. The connecting layer is formed from two layers grown epitaxially in a direction perpendicular to the output direction of the beam. One of the two layers is formed of the same material as the first and second diffraction grating layers.


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