The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2006
Filed:
Dec. 19, 2001
Pablo I. Rovira, San Francisco, CA (US);
Lars Markwort, Saratoga, CA (US);
Pablo I. Rovira, San Francisco, CA (US);
Lars Markwort, Saratoga, CA (US);
Nanometrics Incorporated, Milpitas, CA (US);
Abstract
A metrology device, such as an ellipsometer, includes a light source that produces a pulsed electromagnetic beam, such as a flash bulb or pulsed laser, and a spatially dependent polarizing element that introduces a spatially dependent retardation in the light beam. The use of a pulsed light source is advantageous over a continuous light source, as a pulsed light source generates less heat, is stronger, lasts longer, and does not need the use of a mechanical shutter. The use of a spatially dependent polarizing element advantageously eliminates the use of temporally dependent moving polarization modulation elements, thereby allowing the use of a pulsed light source. Downstream of the spatially dependent polarizing element are the analyzer and a multi-element detector that may be synchronized with the pulsed electromagnetic beam to detect after one or several pulses of light have been emitted from the pulsed light source.