The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2006

Filed:

Sep. 20, 2003
Applicants:

Patrick H. Buffet, Essex Junction, VT (US);

Douglas C. Heaberlin, Underhill, VT (US);

Leah M. P. Pastel, Essex Junction, VT (US);

Yu H. Sun, Williston, VT (US);

Inventors:

Patrick H. Buffet, Essex Junction, VT (US);

Douglas C. Heaberlin, Underhill, VT (US);

Leah M. P. Pastel, Essex Junction, VT (US);

Yu H. Sun, Williston, VT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01R 31/02 (2006.01); G01R 31/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for improving the signal-to-noise ratio in an Idefect test is disclosed. An integrated circuit is divided into a plurality of areas and each area is provided with and bounded by terminals. An Idefect is activated to generate Idefect current within the integrated circuit. An amount of Idefect current generated within each area is measured at the terminals provided thereto. Based on the Icurrent measurement on each area, an Icurrent map is created. By analyzing the Icurrent map, the presence and location of the defect is determined. Based on the determination, the Idefect is isolated.


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