The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2006

Filed:

Apr. 21, 2005
Applicants:

Bart Buijsse, Eindhoven, NL;

Theodorus Hubertus Josephus Bisschops, Eindhoven, NL;

Mark Theo Meuwese, Eindhoven, NL;

Inventors:

Bart Buijsse, Eindhoven, NL;

Theodorus Hubertus Josephus Bisschops, Eindhoven, NL;

Mark Theo Meuwese, Eindhoven, NL;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention describes a particle-optical apparatus arranged to focus a beam () of electrically charged particles with the aid of two particle-optical lens systems (). The lens action is achieved by magnetic fields, which fields are generated by permanent-magnetic materials (). In contrast to magnetic lenses equipped with a coil, it is not easy in the case of lenses equipped with permanent-magnetic material to alter the focusing magnetic field with the aim of altering the optical power. In an apparatus according to the invention, the optical power of the lens systems is altered by altering the energy with which the beam () traverses the lens systems (). This can easily happen by altering the voltage of electrical power supplies ().


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