The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Feb. 28, 2003
Applicants:
Sylvain Cruchon Dupeyrat, Chicago, IL (US);
Mike Nelson, Libertyville, IL (US);
Raymond K. Eby, Grayslake, IL (US);
Inventors:
Sylvain Cruchon Dupeyrat, Chicago, IL (US);
Mike Nelson, Libertyville, IL (US);
Raymond K. Eby, Grayslake, IL (US);
Assignee:
Nanoink, Inc., Chicago, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H02N 2/02 (2006.01); G01B 5/28 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system and method for calibration of nanolithography includes fabricating a nanoscale test pattern, measuring a parameter of the test pattern, and calculating a calibration coefficient from the measured parameter. The calculated calibration coefficient is then used for nanolithography. Nanolithography can be carried out with nanoscopic tips depositing patterning compounds on a substrate.