The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Jan. 22, 2003
Hiroki Ose, Nishishirakawa-gun, JP;
Hiroki Ose, Nishishirakawa-gun, JP;
Shin-Etsu Handotai Co., Ltd., Tokyo, JP;
Abstract
A heat treatment apparatus () having: a susceptor () rotatably provided in a heat treatment vessel (), on which a wafer (W) is placed; a preheat ring () surrounding a periphery of the susceptor () to be close to and in non-contact with the susceptor, which is supported by a base () provided in the heat treatment vessel (); and a heating apparatus () for heating a wafer (W) placed on the susceptor (), wherein the preheat ring () is formed such that an inner peripheral center () is eccentric to an outer periphery (). The preheat ring () is moved around the susceptor (); the preheat ring () is positioned to minimize a distance between the inner peripheral center () of the preheat ring () and the center () of the susceptor (); and thereafter a heat treatment is performed to a wafer (W).