The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7059946 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 13, 2006

Filed:

Apr. 20, 2005
Applicants:

Yaw S. Obeng, Frisco, TX (US);

Peter A. Thomas, Miramar, FL (US);

Patrick J. Kelly, Orlando, FL (US);

Inventors:

Yaw S. Obeng, Frisco, TX (US);

Peter A. Thomas, Miramar, FL (US);

Patrick J. Kelly, Orlando, FL (US);

Assignee:

PsiloQuest Inc., Orlando, FL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention is directed, in general, to a chemical mechanical polishing pad comprising a polishing body and a backing material coupled to the polishing body. The polishing body comprising a compacted thermoplastic foam substrate, wherein the compacted thermoplastic foam substrate has a density that is as at least about 1.1 times greater than an uncompacted thermoplastic foam substrate density. Other aspects of the invention comprise a method for manufacturing the above-described chemical mechanical polishing pad and chemical mechanical polishing apparatus comprising the chemical mechanical polishing pad.


Find Patent Forward Citations

Obeng, Yaw. (2006). Compacted polishing pads for improved chemical mechanical polishing longevity (U.S. Patent No. 7059946). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7059946

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…