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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7057702 B1

PDFFull Text
Date of Patent:
Jun. 06, 2006

Filed:

Jun. 23, 2004

Lithographic apparatus and device manufacturing method

Applicants:

Joeri Lof, Eindhoven, NL;

Johannes Catharinus Hubertus Mulkens, Waalre, NL;

Jeroen Johannes Sophia Maria Mertens, Duizel, NL;

Antonius Johannes Van Der Net, Tilburg, NL;

Ronald Van Der Ham, Maarheeze, NL;

Nicolas Lallemant, Veldhoven, NL;

Marcel Beckers, Eindhoven, NL;

Inventors:

Joeri Lof, Eindhoven, NL;

Johannes Catharinus Hubertus Mulkens, Waalre, NL;

Jeroen Johannes Sophia Maria Mertens, Duizel, NL;

Antonius Johannes Van Der Net, Tilburg, NL;

Ronald Van Der Ham, Maarheeze, NL;

Nicolas Lallemant, Veldhoven, NL;

Marcel Beckers, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:

Pillsbury Winthrop Shaw Pittman LLP

Primary Examiner:

Michael Tokar

Assistant Examiner:

Vivian Nelson

Int. Cl.
CPC ...
G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.

Find Patent Forward Citations

Lof, Joeri. (2006). Lithographic apparatus and device manufacturing method (U.S. Patent No. 7057702). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7057702

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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