The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Feb. 19, 2004
Haiming Wang, Fremont, CA (US);
Jeffrey T. Fanton, Los Altos, CA (US);
Lanhua Wei, Fremont, CA (US);
Haiming Wang, Fremont, CA (US);
Jeffrey T. Fanton, Los Altos, CA (US);
Lanhua Wei, Fremont, CA (US);
Therma-Wave, Inc., Fremont, CA (US);
Abstract
A real-time calibration method for beam profile ellipsometry systems includes projecting an electromagnetic probe beam having a known polarization state though an objective lens onto the surface of a subject and collecting the reflected probe beam using the same objective. The reflected probe beam is then passed through a rotating compensator and analyzer before being received by a detector. A processor performs a harmonic analysis on the detector output to determine normalized Fourier coefficients. The processor uses Fourier coefficients to measure the retardation δand the azimuth angle Qof the objective lens; and uses the retardation δand the azimuth angle Qto identify the ellipsometric effects of the objective lens.