The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Apr. 07, 2003
Applicants:
Sang-jin Hyun, Kyungki-do, KR;
Sug-hun Hong, Kyungki-do, KR;
Yu-gyun Shin, Sungnam, KR;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract
Oxide layers, including gate oxide layers having different thicknesses, are formed, plasma nitridized, and oxidized in an oxygen atmosphere containing hydrogen at a high temperature. Electron trap sites and stress occurring during plasma nitridation may be removed during oxidation.
Hyun, Sang-jin. (2006). Methods of fabricating oxide layers by plasma nitridation and oxidation (U.S. Patent No. 7053006). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7053006
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile