The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Jun. 24, 2002
Nobuhito Katsumura, Yokohama, JP;
Yoshiteru Katsumura, Yokohama, JP;
Hidemi Sato, Yokohama, JP;
Norihiro Uchida, Hitachinaka, JP;
Fumiyuki Kanai, Nishitokyo, JP;
Nobuhito Katsumura, Yokohama, JP;
Yoshiteru Katsumura, Yokohama, JP;
Hidemi Sato, Yokohama, JP;
Norihiro Uchida, Hitachinaka, JP;
Fumiyuki Kanai, Nishitokyo, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
A buried film and a barrier film are polished together using a slurry in which the polishing rate on a substrate material (in particular, silicon oxide), that on a buried-film material (in particular, tungsten) and that on a barrier-film material (in particular, titanium oxide) are substantially equal to one another. This can materialize a buried structure free from any step or steps, at a high polishing rate.