The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2006

Filed:

Mar. 04, 2005
Applicants:

Satoshi Tateiwa, Tokyo, JP;

Ken Kimura, Tokyo, JP;

Takayuki Umahashi, Tokyo, JP;

Inventors:

Satoshi Tateiwa, Tokyo, JP;

Ken Kimura, Tokyo, JP;

Takayuki Umahashi, Tokyo, JP;

Assignee:

Disco Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 55/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A liquid jet machining apparatus including holding means for holding a workpiece, liquid jet application means for applying a liquid jet to the workpiece held by the holding means, and catching means for catching the liquid jet which has penetrated the workpiece. The catching means includes a tank for accommodating a liquid. At the bottom of the tank, a cushioning member is replaceably disposed, and an abrasive is accumulated. The liquid jet having penetrated the workpiece acts on the liquid accommodated in the tank, and then acts on the cushioning member and the abrasive. Wave suppressing means for suppressing generation of waves due to the liquid jet acting on the liquid accommodated within the tank is disposed in an upper portion of the tank.


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