The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2006
Filed:
Jan. 14, 2004
Ulrich Baier, Dresden, DE;
Oliver Genz, Dresden, DE;
Ulrich Baier, Dresden, DE;
Oliver Genz, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A process for introducing structures that have different dimensions, particularly with regard to depth, in which just one lithography level is required, is disclosed. This is achieved by use of a layer stack deposited on a substrate, where one layer in particular is used to store information related to the dimensioning of the different structures. The layer is partially opened up to expose the substrate at locations corresponding to where deep structures are to be formed. Deep structures are subsequently etched into the substrate, after which the layer is opened up at locations corresponding to where shallow structures are to be formed. The latter locations are subsequently etched to the desired depth of the shallower structures. The process can be used instead of conventional the dual damascene technology for the structuring of contact holes and interconnects.