The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Jul. 22, 2003
Giuseppe Coppola, Pomigliano D'Arco, IT;
Pietro Ferraro, Naples, IT;
Mario Iodice, Naples, IT;
Sergio DE Nicola, Naples, IT;
Giuseppe Coppola, Pomigliano D'Arco, IT;
Pietro Ferraro, Naples, IT;
Mario Iodice, Naples, IT;
Sergio De Nicola, Naples, IT;
Consiglio Nazionale Delle Ricerche, Rome, IT;
Abstract
Interferometric system for the simultaneous measurement of the index of refraction and of the thickness of transparent materials with a single measurement operation. The system employs an interferometer as a 'shear interferometer' with the advantage of varying the wavelength of the luminous source. The index of refraction and the thickness are determined in two phases. Firstly it is determined the optical path analyzing the displacement of interferometric signal obtained by orthogonal incidence; successively, by means of phase recovery techniques and the previously determined optical path value, it is possible to obtain the index of refraction of the material. From the knowledge of the index and of the optical path it is obtained the material thickness.