The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Jun. 29, 2004
James P. Mcguire, Pasadena, CA (US);
James P. McGuire, Pasadena, CA (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
An illumination system and condenser for use in photolithography in the extreme ultraviolet wavelength region has a first non-imaging optic element collecting electromagnetic radiation from a source and creates a desired radiance distribution. A second non-imaging optic element receives the electromagnetic radiation from the first non-imaging optic element and redirects and images the electromagnetic radiation. The electromagnetic radiation from the second non-imaging optic element is suitable for being received by other conventional optical surfaces to provide a desired radiance distribution with a desired angular distribution and desired shape. Facets are used to provide the desired illumination over the desired illumination field. Reflective facets may be placed on the second non-imaging optic, which can reduce the number of mirrors and increase efficiency. The condenser and illumination system are used in combination with a projection optic to project the image of a reticle or mask onto a photosensitive substrate, such as a semiconductor wafer. The condenser of the present invention provides an efficient condenser in a compact package and provides desirable illumination properties for imaging relatively small feature sizes of less than 0.13 microns.