The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Dec. 06, 2004
Takanori Yamagishi, Funabashi, JP;
Kazuhiko Mizuno, Sodegaura, JP;
Tomo Oikawa, Ichihara, JP;
Ichiro Kato, Chiba, JP;
Takanori Yamagishi, Funabashi, JP;
Kazuhiko Mizuno, Sodegaura, JP;
Tomo Oikawa, Ichihara, JP;
Ichiro Kato, Chiba, JP;
Maruzen Petrochemical Co. Ltd., Tokyo, JP;
Abstract
Provided are a preparation process of a copolymer for semiconductor lithography, suited for a film forming composition used for the formation of minute patterns necessary for semiconductor fabrication, which comprises carrying out radical polymerization of at least two monomers having an ethylenic double bond in the presence of a polymerization initiator in a polymerization solvent, while causing to exist, in the solution containing the monomers, a polymerization inhibitive component; and a copolymer for semiconductor lithography prepared by the above-described process, and contains no high polymer, has excellent storage stability and generates remarkably less defects in resist pattern when used for semiconductor lithography.