The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2006

Filed:

Oct. 05, 2001
Applicants:

Natsuko Ito, Tokyo, JP;

Fumihiko Uesugi, Tokyo, JP;

Tsuyoshi Moriya, Tokyo, JP;

Inventors:

Natsuko Ito, Tokyo, JP;

Fumihiko Uesugi, Tokyo, JP;

Tsuyoshi Moriya, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3111 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a semiconductor device manufacturing apparatus that processing a substrate by applying a voltage to a gas to create a plasma, positively charged particles are trapped or guided at the instant that the cathode voltage is stopped, by an electrode to which is imparted a negative voltage, so as to prevent particles reaching the substrate.


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