The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Nov. 15, 2004
Applicants:
Peter Biolsi, New Windsor, NY (US);
Samuel S. Choi, Beacon, NY (US);
Inventors:
Peter Biolsi, New Windsor, NY (US);
Samuel S. Choi, Beacon, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/461 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods of etching a dielectric layer and a cap layer over a conductor level to open a via to the conductor. The methods include the provision of tetrafluoro methane (CF) in a photoresist strip. In addition, the methods may provide an increased amount of tetrafluoro methane (CF) in a dielectric layer etch, and trifluoro methane (CHF) in a cap layer etch. The invention provides higher yield, more predictable etch rates, faster processing, and removes the need for an ash step.