The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2006
Filed:
Jul. 15, 2004
Simon Mcclatchie, Fremont, CA (US);
Sabir Majumder, Fremont, CA (US);
Ren Zhou, Fremont, CA (US);
Xuyen Pham, Fremont, CA (US);
Tuan A. Nguyen, San Jose, CA (US);
Simon McClatchie, Fremont, CA (US);
Sabir Majumder, Fremont, CA (US);
Ren Zhou, Fremont, CA (US);
Xuyen Pham, Fremont, CA (US);
Tuan A. Nguyen, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An apparatus and method for evenly distributing a polishing fluid onto a polishing pad during a chemical mechanical planarization process, wherein the polishing fluid is dispersed by way of a spray being emitted from a spray nozzle. The pattern of polishing fluid applied to the polishing pad can be modified by adjustment of geometric parameters of the spray nozzle. The apparatus is configured with actuating mechanisms for translating and rotating the spray nozzle relative to the polishing pad in order to adjust a pattern of distribution of the polishing fluid. The method of dispersing polishing fluid onto the polishing pad produces an even distribution of polishing fluid across a width of the polishing pad.