The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2006

Filed:

Feb. 03, 2003
Applicants:

Mitsukazu Takahashi, Kyoto, JP;

Tosiyuki Kobayashi, Kyoto, JP;

Toshimitsu Funayoshi, Kyoto, JP;

Inventors:

Mitsukazu Takahashi, Kyoto, JP;

Tosiyuki Kobayashi, Kyoto, JP;

Toshimitsu Funayoshi, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27B 5/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A thermal processing apparatus, performing processing accompanied with heating on a substrate, having an upper lamp group directed toward a prescribed direction and a lower lamp group perpendicularly intersecting with the upper lamp group is provided with a lower reflector between the upper and lower lamp groups. The lower reflector is so provided as to reflect light from lamps, included in the lower lamp group, present on both end regions in relation to the direction of arrangement. Thus, the thermal processing apparatus can efficiently irradiate an auxiliary ring with reflected light from the lower lamp group and improve temperature uniformity when heating the substrate.


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