The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2006
Filed:
Jun. 27, 2003
John S. NG, Chicago, IL (US);
Ping T. Wang, Ballwin, MO (US);
Julio A. Baez, San Diego, CA (US);
Chin Liu, Vernon Hills, IL (US);
Dennis K. Anderson, St. Charles, MO (US);
Jon P. Lawson, Glencoe, MO (US);
Bernhard Erb, Gipf-Oberfrick, CH;
Joseph Wieczorek, Cary, IL (US);
Gennaro Mucciariello, Rovereto, IT;
Fortunato Vanzanella, Naples, IT;
Sastry A. Kunda, Chesterfield, MO (US);
Leo J. Letendre, Manchester, MO (US);
Mark J. Pozzo, Chesterfield, MO (US);
Yuen-lung L. Sing, St. Louis, MO (US);
Edward E. Yonan, Carol Stream, IL (US);
John S. Ng, Chicago, IL (US);
Ping T. Wang, Ballwin, MO (US);
Julio A. Baez, San Diego, CA (US);
Chin Liu, Vernon Hills, IL (US);
Dennis K. Anderson, St. Charles, MO (US);
Jon P. Lawson, Glencoe, MO (US);
Bernhard Erb, Gipf-Oberfrick, CH;
Joseph Wieczorek, Cary, IL (US);
Gennaro Mucciariello, Rovereto, IT;
Fortunato Vanzanella, Naples, IT;
Sastry A. Kunda, Chesterfield, MO (US);
Leo J. Letendre, Manchester, MO (US);
Mark J. Pozzo, Chesterfield, MO (US);
Yuen-Lung L. Sing, St. Louis, MO (US);
Edward E. Yonan, Carol Stream, IL (US);
G.D. Searle & Co., St. Louis, MO (US);
Abstract
Multiple novel reaction schemes, novel process steps and novel intermediates are provided for the synthesis of epoxymexrenone and other compounds of Formula Iwherein: