The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2006

Filed:

Jul. 23, 2003
Applicants:

Hikaru Sugita, Yokkaichi, JP;

Keiji Konno, Yokkaichi, JP;

Masato Tanaka, Yokkaichi, JP;

Tsutomu Shimokawa, Suzuka, JP;

Inventors:

Hikaru Sugita, Yokkaichi, JP;

Keiji Konno, Yokkaichi, JP;

Masato Tanaka, Yokkaichi, JP;

Tsutomu Shimokawa, Suzuka, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 32/08 (2006.01); C08F 12/32 (2006.01); C08F 132/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

Novel compounds acetoxymethylacenaphthylene and hydroxymethylacenaphthyleneare disclosed. A polymer prepared from these novel compounds containing a structural unit of the formula (3),wherein Ris a hydrogen atom and Rand Rindividually represent a monovalent atom or a monovalent organic group is also disclosed. The polymer is suitable as a component for an antireflection film-forming composition exhibiting a high antireflection effect and not causing intermixing with a resist film.


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