The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2006
Filed:
Oct. 10, 2000
Ali Afzali-ardakani, Yorktown Heights, NY (US);
Tricia Lynn Breen, Hopewell Junction, NY (US);
Jeffrey Donald Gelorme, Plainville, CT (US);
David Brian Mitzi, Mahopac, NY (US);
Michael Joseph Rooks, Briarcliff Manor, NY (US);
Ali Afzali-Ardakani, Yorktown Heights, NY (US);
Tricia Lynn Breen, Hopewell Junction, NY (US);
Jeffrey Donald Gelorme, Plainville, CT (US);
David Brian Mitzi, Mahopac, NY (US);
Michael Joseph Rooks, Briarcliff Manor, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A high sensitivity, organic solvent developable, high resolution photoresist composition for use in E-beam lithography is disclosed. The composition of the present invention comprises a high sensitivity, soluble, film forming photoresist composition of dendrimeric calix [4]arene derivatives and processes for forming lithographic patterns with a crosslinker selected from glycoluril derivatives capable of reacting with these dendrimer under acid catalysis, a photoacid generator and an organic solvent. The composition of the present invention is particularly useful for production of negative tone images of high resolution (less than 100 nanometers).