The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2006
Filed:
Jun. 26, 2002
Hideo Kaneko, Niigata-ken, JP;
Yukio Inazuki, Niigata-ken, JP;
Tetsushi Tsukamoto, Niigata-ken, JP;
Satoshi Okazaki, Niigata-ken, JP;
Hideo Kaneko, Niigata-ken, JP;
Yukio Inazuki, Niigata-ken, JP;
Tetsushi Tsukamoto, Niigata-ken, JP;
Satoshi Okazaki, Niigata-ken, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A phase shift mask blank is composed of a transparent substrate and a phase shift film thereon. The phase shift film is made of at least two types of layer stacked in alternation, each type having a different composition and containing at least one element selected from among metals, silicon, oxygen and nitrogen. The alternately layered film enables a high-quality phase shift mask blank having improved chemical resistance to be achieved.