The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Jun. 25, 2004
Applicants:
Takaya Satoh, Tokyo, JP;
Yoshihiro Kammei, Tokyo, JP;
Tatsuji Kobayashi, Tokyo, JP;
Mitsuyasu Iwanaga, Tokyo, JP;
Inventors:
Takaya Satoh, Tokyo, JP;
Yoshihiro Kammei, Tokyo, JP;
Tatsuji Kobayashi, Tokyo, JP;
Mitsuyasu Iwanaga, Tokyo, JP;
Assignee:
JEOL Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 59/44 (2006.01); H01J 49/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A time-of-flight mass spectrometer capable of cutting out a major portion of carrier gas-derived ions ahead of the ion reservoir. The ion source is of the electron impact type and has source magnets for deflecting some of the produced ions away from the center axis of the ion reservoir. Electrostatic lenses for promoting the deflection of the ions caused by the source magnets and a differentially pumped slit for cutting off the deflected ions are mounted downstream of the ion source.