The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Aug. 01, 2003
Maxwell W. Lippitt, Iii, Rockwall, TX (US);
Craig G. Clabough, Cocoa Beach, FL (US);
Joseph W. Buckfeller, Windermere, FL (US);
Timothy J. Daniel, Orlando, FL (US);
Maxwell W. Lippitt, III, Rockwall, TX (US);
Craig G. Clabough, Cocoa Beach, FL (US);
Joseph W. Buckfeller, Windermere, FL (US);
Timothy J. Daniel, Orlando, FL (US);
Agere Systems Inc., Allentown, PA (US);
Abstract
A physical vapor deposition process for maintaining the wafer below a critical temperature. The rate at which material particles are sputtered from the target and thus deposited on the wafer is controllable in response to power supplied to the target. Maintaining a desired deposition rate maintains the wafer temperature below the critical temperature.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile