The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7030506 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 18, 2006

Filed:

Oct. 15, 2003
Applicants:

Syed Shoaib Hasan Zaidi, Poughkeepsie, NY (US);

Alois Gutmann, Dresden, DE;

Gary Williams, Mechanicsville, VA (US);

Inventors:

Syed Shoaib Hasan Zaidi, Poughkeepsie, NY (US);

Alois Gutmann, Dresden, DE;

Gary Williams, Mechanicsville, VA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and mask to improve measurement of alignment marks is disclosed. An exemplary embodiment of the invention includes a resist mask with a patterned alignment mark comprising an assemblage of features whose spacing is smaller than the wavelength of light used to measure the alignment. In a preferred embodiment, an alignment mark patterning process alters the appearance of the alignment mark and renders an enhanced contrast with the substrate background.


Find Patent Forward Citations

Zaidi, Syed Shoaib Hasan. (2006). Mask and method for using the mask in lithographic processing (U.S. Patent No. 7030506). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7030506

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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