The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2006

Filed:

Apr. 12, 2001
Applicants:

Michael Abraham, Mainz, DE;

Ivo J M M Raaijmakers, Bilthoven, NL;

Alain Gaudon, Launac, FR;

Pierre Astegno, Saint Jory, FR;

Inventors:

Michael Abraham, Mainz, DE;

Ivo J M M Raaijmakers, Bilthoven, NL;

Alain Gaudon, Launac, FR;

Pierre Astegno, Saint Jory, FR;

Assignees:

Nanophotonics AG, Mainz, DE;

Recif SA, Aussonne, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/86 (2006.01); B63H 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate measurement system including a measurement chamber and a substrate handling chamber possessing a substrate transfer and a substrate container interface arranged to receive a substrate to container. The handling chamber contains a first interface to connect the measurement chamber and the measurement chamber contains a second interface to connect the handling chamber. The transfer means is arranged to transfer substrates between the container and the measurement chamber through the handling chamber, in which system a second measurement chamber is provided, having the same second interface as the first measurement chamber to replace latter chamber.


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