The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
Aug. 17, 2000
Method for treating substrates for microelectronics and substrates obtained according to said method
Thierry Barge, Grenoble, FR;
André Auberton-herve, St. Egreve, FR;
Hiroji Aga, Annaka Gunma, JP;
Naoto Tate, Annaka Gunma, JP;
Thierry Barge, Grenoble, FR;
André Auberton-Herve, St. Egreve, FR;
Hiroji Aga, Annaka Gunma, JP;
Naoto Tate, Annaka Gunma, JP;
S.O.I.Tec Silicon on Insulator Technologies S.A., Bernin, FR;
Abstract
The invention relates to a method for treating substrates () for microelectronics or optoelectronics, whereby said substrates comprise a useful layer () on at least one of the surfaces thereof. The inventive method includes a mechanical/chemical polishing step occurring on a bare surface () of the useful layer and is characterized in that it also comprises a post-curing step in a reductive atmosphere () before said polishing step occurs.