The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
May. 06, 2003
Chih-yuh Yang, San Jose, CA (US);
Shibly S. Ahmed, San Jose, CA (US);
Srikanteswara Dakshina-murhty, Austin, TX (US);
Cyrus E. Tabery, Sunnyvale, CA (US);
Bin Yu, Cupertino, CA (US);
Chih-Yuh Yang, San Jose, CA (US);
Shibly S. Ahmed, San Jose, CA (US);
Srikanteswara Dakshina-Murhty, Austin, TX (US);
Cyrus E. Tabery, Sunnyvale, CA (US);
Bin Yu, Cupertino, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method of manufacturing a semiconductor device may include forming a fin structure on an insulator and depositing a gate material over the fin structure. The method may also include depositing an organic anti-reflective coating on the gate material and forming a gate mask on the organic anti-reflective coating. The organic anti-reflective coating around the gate mask may be removed, and the gate material around the gate mask may be removed to define a gate.