The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
Oct. 18, 2002
Applicants:
Wei-yu Su, Taipei, TW;
Dong-hsu Cheng, Hsin-chu, TW;
Li-kong Turn, Taichung, TW;
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Co Ltd, Hsin Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); A47G 1/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (RN)Cl. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.