The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2006

Filed:

Dec. 08, 2003
Applicant:

Jess Koehler, Immenstaad, DE;

Inventor:

Jess Koehler, Immenstaad, DE;

Assignee:

Carl Zeiss SMT AG, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G02B 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An optical system for providing a useful light beam, having one or more optical components () which attenuate a useful light fraction with a first linear polarization state less strongly than a useful light fraction with a second linear polarization state different from the first state. A compensation unit is provided which includes a transmission plate () that is introduced into the useful light beam path () inclined (β) to the optical axis, and attenuates the useful light fraction with the first linear polarization state more strongly than that with the second linear polarization state. As a result, the imbalance, caused by the system without a compensation unit, of the two useful light fractions can be compensated completely or in any case partially. The optical system is used, for example, in illuminating systems and projection objectives of microlithographic projection exposure apparatuses.


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