The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Apr. 28, 2004
Christopher A. Spence, Sunnyvale, CA (US);
Todd P. Lukanc, San Jose, CA (US);
Luigi Capodieci, Santa Cruz, CA (US);
Joerg Reiss, Sunnyvale, CA (US);
Sarah N. Mcgowan, San Francisco, CA (US);
Christopher A. Spence, Sunnyvale, CA (US);
Todd P. Lukanc, San Jose, CA (US);
Luigi Capodieci, Santa Cruz, CA (US);
Joerg Reiss, Sunnyvale, CA (US);
Sarah N. McGowan, San Francisco, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A system and method for generating an illumination intensity profile of an illuminator that forms part of a projection lithography system. Radiation from the illuminator is projected towards an illumination profile mask having a plurality of apertures such that each aperture passes a distinct portion of the radiation. The intensity of each of the distinct portions of radiation is detected and assembled to form the illumination intensity profile.