The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Aug. 07, 2003
Applicants:
Hiroshi Kawashima, Tokyo, JP;
Yoshitaka Yamada, Tokyo, JP;
Inventors:
Hiroshi Kawashima, Tokyo, JP;
Yoshitaka Yamada, Tokyo, JP;
Assignee:
Renesas Technology Corp., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03F 1/08 (2006.01); G06F 17/50 (2006.01); G06K 9/03 (2006.01);
U.S. Cl.
CPC ...
Abstract
First, a correction is made for correcting the mask pattern configuration of a photomask () used for exposure in accordance with the space between a mask pattern and an adjacent mask pattern thereto and a desired configuration to be transferred from the mask pattern. Second, a correction is made for dividing the photomask () into a plurality of mesh regions (M) to correct the pattern configuration of the photomask () in accordance with the occupation rate (R) of the mask pattern in each of the mesh regions (M).