The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Jun. 10, 2002
Louis L. Hsu, Fishkill, NY (US);
Carl J. Radens, LaGrangeville, NY (US);
Li-kong Wang, Montvale, NJ (US);
Kwong Hon Wong, Wappingers Falls, NY (US);
Louis L. Hsu, Fishkill, NY (US);
Carl J. Radens, LaGrangeville, NY (US);
Li-Kong Wang, Montvale, NJ (US);
Kwong Hon Wong, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An electronically programmable mask for lithography has an array of individually controllable light sources aligned with an array of individually controllable liquid crystals, so that individual pixels may be turned on or off and phase-shifted to provide a desired light intensity distribution on a wafer. The mask may be used in a contact printing mode or in a reduction projection mode.