The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Dec. 18, 2003
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Harm-jan Voorma, Zaltbommel, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Harm-Jan Voorma, Zaltbommel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or adjacent an intermediate focus of the projection system. Besides a radiation attenuator or a variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in or adjacent the intermediate focus of the projection system, instead of adjacent the reticle in the illumination system, fewer design restrictions occur because of more space available, resulting in a lower design cost.